ベイク処理にはさまざまなセッティングがあります。
ベイク処理は Lightmapping クラスによって開始することができます。
See Also: Lightmapping.
| aoExponentDirect | Ambient occlusion (AO) for direct lighting. |
| aoExponentIndirect | Ambient occlusion (AO) for indirect lighting. |
| aoMaxDistance | 値の距離より向こうにはオクルージョンがかからない。 |
| bakeResolution | Specifies the resolution of the Baked lightmap in texels per world unit. Specifying higher resolutions can significantly increase the time it takes to bake the lightmap. The default value is one texel per world unit. The minimum value is 0.0001. |
| enableAmbientOcclusion | Enable baked ambient occlusion (AO). |
| filterTypeAO | Configure a filter kernel for the ambient occlusion target. |
| filterTypeDirect | Configure a filter kernel for the direct light target. |
| filterTypeIndirect | Configure a filter kernel for the indirect light target. |
| lightmapper | Determines which backend to use for baking lightmaps. |
| maxAtlasSize | The maximum size of an individual lightmap texture. |
| padding | 形状間のテクセル間隔。 |
| realtimeResolution | Lightmap resolution in texels per world unit. Defines the resolution of Realtime GI if enabled. If Baked GI is enabled, this defines the resolution used for indirect lighting. Higher resolution may take a long time to bake. |
| reflectionCubemapCompression | リフレクション キューブマップのベイク圧縮方法を選択します |
| sampling | Determines which sampling strategy to use for baking lightmaps with the Progressive Lightmapper. |
| textureCompression | Whether to use texture compression on the generated lightmaps. |